Title:
A film deposition system and a membrane formation work manufacturing method
Document Type and Number:
Japanese Patent JP6209286
Kind Code:
B2
Abstract:
A film formation apparatus and a film-formed workpiece manufacturing method which are capable of forming a film with a uniform thickness on a workpiece like a three-dimensional object that includes a plurality of surfaces by a simple structure are provided. A film formation apparatus includes a target 21 that is a film formation material including a plane SU3, a power supply unit 3 applying power to the target 21, a rotating unit 4 rotating a workpiece W that is a film formation object around a rotation axis AX1, and a revolving unit 5 revolving the rotating unit 4 around a revolution axis AX2 separate from the rotation axis AX1 to repeatedly make the workpiece W to come close to and move apart from the target 21.
Inventors:
Youtaro Fukuoka
Sousuke Yagi
Sousuke Yagi
Application Number:
JP2016546860A
Publication Date:
October 04, 2017
Filing Date:
February 29, 2016
Export Citation:
Assignee:
Shibaura Mechatronics Co., Ltd.
International Classes:
C23C14/50; C23C14/34
Domestic Patent References:
| JP6254089A | ||||
| JP61179885A | ||||
| JP6220348A | ||||
| JP10298752A | ||||
| JP1012733A | ||||
| JP2008138276A | ||||
| JP2006342384A | ||||
| JP201194163A |
Attorney, Agent or Firm:
Kiuchi Mitsuharu
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