A fluid bed reaction machine and a method of manufacturing granular polysilicon

Title:

A fluid bed reaction machine and a method of manufacturing granular polysilicon

Document Type and Number:

Japanese Patent JP6149154

Kind Code:

B2

Abstract:

The fluidized bed process for preparing polysilicon by chemical vapor deposition is improved by positioning at least one Laval nozzle upstream from a gas inlet into the reactor.

More Like This:

WO/2020/213472	METHOD FOR PRODUCING SILICON MICROPARTICLES
WO/2002/020404	METHOD FOR PRODUCING TRICHLOROSILANE

Inventors:

Pedron, Gimon
Forstpointner, Gehart

Application Number:

JP2016512281A

Publication Date:

June 14, 2017

Filing Date:

April 28, 2014

Export Citation:

Click for automatic bibliography generation Help

Assignee:

Wacker Chemie AG

International Classes:

C01B33/03; B01J8/24

Domestic Patent References:

JP2009502704A
JP2011526877A
JP1119508A
JP11510560A
JP2011208523A

Attorney, Agent or Firm:

Kawaguchi International Patent Office

Previous Patent: A device, a program, and a recording medium for managing a corruption risk of a vessel

Next Patent: CERAMIC LABEL