Title:
A hard mask formation method and a hard mask forming device
Document Type and Number:
Japanese Patent JP6030589
Kind Code:
B2
Abstract:
A method of forming a hard mask includes depositing step for depositing a titanium nitride film on a surface of a to-be-processed object; adsorbing step for adsorbing oxygen-containing molecules onto a surface of the titanium nitride film; and heating step for heating the titanium nitride film to a predetermined temperature.
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Inventors:
Kenmei Nakano
Application Number:
JP2014025899A
Publication Date:
November 24, 2016
Filing Date:
February 13, 2014
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/58; C23C14/06
Domestic Patent References:
| JP63303066A | ||||
| JP2000294738A | ||||
| JP2013232470A |
Attorney, Agent or Firm:
Seiryu Corporation