Title:
An irradiation system for stereolithography devices
Document Type and Number:
Japanese Patent JP6116118
Kind Code:
B2
Abstract:
The invention concerns an illumination system (30) for use in a stereolithography apparatus (1), comprising a planar support supporting a twodimensional array (32) of individually controllable wide-angle light-emitting diodes (LEDs) (34) comprising light emitting surfaces; and a multilens projector array (40, 42) arranged relative to the array, and adapted to project the light-emitting surfaces of the LEDs onto a work area (16). The multilens projector array is arranged to project light from the LED array having a light emitting edge area focus error which is smaller than or equal to a light emitting central area focus error.
Inventors:
Jamal, Jacobs Hubertus Theodor
Marderink, Hermann Hendricks
Reifels, Andries
Kluisinga, Borgert
Koistra, Yantzkedee.
Marderink, Hermann Hendricks
Reifels, Andries
Kluisinga, Borgert
Koistra, Yantzkedee.
Application Number:
JP2011552896A
Publication Date:
April 19, 2017
Filing Date:
March 08, 2010
Export Citation:
Assignee:
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
International Classes:
G03F7/20; H01L33/00
Domestic Patent References:
| JP2012519875A | ||||
| JP2007190811A | ||||
| JP3107102A | ||||
| JP2000066008A | ||||
| JP2000241754A | ||||
| JP2008523451A | ||||
| JP2001352429A | ||||
| JP63312129A |
Attorney, Agent or Firm:
Masahiko Sudo