Title:
METHOD FOR MANUFACTURING OXIDATION COLOR DEVELOPMENT ELECTROCHROMIC THIN FILM
Document Type and Number:
Japanese Patent JP2017155272
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for advantageously manufacturing an oxidation color development electrochromic thin film excellent in electrochemical characteristics in cost.SOLUTION: The method for manufacturing an oxidation color development electrochromic thin film includes the DC sputtering step of performing DC sputtering in a mixed gas atmosphere of rare gas and vapor using metal or a metal compound used as the material of an electrochromic thin film as a target. A composition ratio of the vapor to the mixed gas is preferably 0.4-0.7, more preferably 0.45-0.6, or may be more than 0.7 and less than 1, more preferably 0.9-0.99. An argon gas is preferable as the rare gas, and at least one kind selected from Ni, Ir, Rh, Cr, Fe or In is preferable as a metal element constituting the metal or metal compounds of the target.SELECTED DRAWING: Figure 1
Inventors:
NARAI SATORU
ABE YOSHIO
ABE YOSHIO
Application Number:
JP2016038391A
Publication Date:
September 07, 2017
Filing Date:
February 29, 2016
Export Citation:
Assignee:
KOBE STEEL LTD
KITAMI INSTITUTE OF TECH
KITAMI INSTITUTE OF TECH
International Classes:
C23C14/06; C09K9/00; C23C14/34; G02F1/15
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Kenichi Fujinaka
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