Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
A manufacturing method, a photomask, and a pattern transfer method of a photomask
Document Type and Number:
Japanese Patent JP6106579
Kind Code:
B2
More Like This:
JP5470339Method for manufacturing transfer masks and semiconductor devices
JPS63180953MASK CLEANING DEVICE
JP3277404SUBSTRATE CLEANING METHOD
Inventors:
Masayuki Miyoshi
Seiji Tsuboi
Application Number:
JP2013242843A
Publication Date:
April 05, 2017
Filing Date:
November 25, 2013
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HOYA CORPORATION
International Classes:
G03F1/82; G03F1/26
Domestic Patent References:
JP8278625A
JP2007133098A
JP2011013283A
JP8220731A
JP2010039300A
Foreign References:
KR1020080025342B1
Attorney, Agent or Firm:
Patent business corporation Tsukuni
Hajime Tsukuni
Keiko Ozawa
Akio Shibata
Sugimoto Shoichi



 
Previous Patent: Rushes adjuster

Next Patent: DRIVING STRUCTURE OF MOVABLE MEMBER IN MOLD