Title:
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2018018087
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having an excellent shape.SOLUTION: The resist composition contains: a resin whose solubility in an alkaline aqueous solution increases by the action of an acid; an acid generator; a compound represented by formula (I); and a solvent. The content of the solvent is 40-75 mass% based on the total amount of the resist composition. [In the formula (I), ring Wrepresents a heterocyclic ring having a nitrogen atom as an atom constituting the ring, or a benzene ring having a substituted or unsubstituted amino group; Arepresents a phenyl group or a naphthyl group; and n represents 2 or 3.]SELECTED DRAWING: None
Inventors:
SUGIHARA MASAKO
KAWAMURA MAKI
KAWAMURA MAKI
Application Number:
JP2017164049A
Publication Date:
February 01, 2018
Filing Date:
August 29, 2017
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
G03F7/004; C08F12/22; C08F20/18; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013167781A | 2013-08-29 | |||
| JP2008151953A | 2008-07-03 | |||
| JP2011209681A | 2011-10-20 | |||
| JP2002148801A | 2002-05-22 | |||
| JP2003156849A | 2003-05-30 | |||
| JP2011232648A | 2011-11-17 | |||
| JP2005266799A | 2005-09-29 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto