A manufacturing method of a semiconductor device, a semiconductor manufacturing device

Title:

A manufacturing method of a semiconductor device, a semiconductor manufacturing device

Document Type and Number:

Japanese Patent JP6052291

Kind Code:

B2

Abstract:

A semiconductor device manufacturing method according to the present invention includes a step of arranging a plurality of processing objects on a first tray and a second tray adjacent to the first tray, a plurality of application steps in which application of an application substance to the plurality of processing objects is repeated a certain number of times by emitting the application substance from an application device formed right above a contact position at which the first tray and the second tray contact each other, by swinging the application device along a first direction across the contact position, and by moving the first tray and the second tray in a second direction perpendicular to the first direction, and an interchange step of interchanging the first tray and the second tray in position without changing the directions of the first tray and the second tray corresponding to the second direction, the interchange step being executed at least one time among the plurality of application steps.

Inventors:

Tomohide Terashima
Yasuhiro Yoshiura
Otsuki

Application Number:

JP2014537877A

Publication Date:

December 27, 2016

Filing Date:

September 26, 2012

Export Citation:

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