Title:
A manufacturing method of the substrate and the photosensitive low refractive-index transfer layer which have a photosensitive transfer material and a photosensitive low refractive-index transfer layer, a formation method of a permanent film, a manufacturing method of an optical device
Document Type and Number:
Japanese Patent JP6012755
Kind Code:
B2
Inventors:
Hideyuki Nakamura
Susumu Fujimoto
Shinichi Kanna
Susumu Fujimoto
Shinichi Kanna
Application Number:
JP2014546978A
Publication Date:
October 25, 2016
Filing Date:
November 12, 2013
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
B32B7/02; B32B27/18; B32B27/30; F21S2/00; G02B1/111; G02B5/20; G03F7/004; G03F7/027; G03F7/038
Domestic Patent References:
| JP2006293331A | 2006-10-26 | |||
| JP2008146018A | 2008-06-26 | |||
| JP2012032673A | 2012-02-16 | |||
| JP2012013962A | 2012-01-19 | |||
| JP2006293331A | 2006-10-26 |
Attorney, Agent or Firm:
Patent Service Corporation Taiyo International Patent Office
Yasuhiro Noguchi
Yasuhiro Noguchi