Title:
A manufacturing method of a transparent conductive film
Document Type and Number:
Japanese Patent JP6228846
Kind Code:
B2
Abstract:
Disclosed is a manufacturing method for a transparent electroconductive film having excellent light-transmitting properties and low specific resistance. The present invention provides a method of manufacturing a transparent electroconductive film which comprises a film substrate and a crystallized indium tin oxide layer formed on the film substrate. The method comprises: a step of placing the film substrate in a sputtering apparatus using an indium tin oxide as a target material, and depositing indium tin oxide including amorphous parts on the film substrate by a magnetron sputtering process in which a horizontal magnetic field on the target material is set to 50 mT or more; and a step of, after the step of depositing indium tin oxide including amorphous parts, subjecting the indium tin oxide including amorphous parts to a heating treatment to thereby crystallize the indium tin oxide including amorphous parts to form the crystallized indium tin oxide layer.
Inventors:
Worshipor Motoki
Yusuke Yamamoto
Tomoki Nashiki
Kazuaki Sasa
Yusuke Yamamoto
Tomoki Nashiki
Kazuaki Sasa
Application Number:
JP2013547181A
Publication Date:
November 08, 2017
Filing Date:
November 28, 2012
Export Citation:
Assignee:
NITTO DENKO CORPORATION
International Classes:
H01B13/00; B32B7/02; B32B37/00; H01B5/14
Domestic Patent References:
| JP2011037679A | ||||
| JP2004349112A | ||||
| JP2004197178A | ||||
| JP2009238416A |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Yoshinori Kishi
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