Title:
Thin-film masks, thin-film mask preparations, thin-film mask manufacturing methods, pattern manufacturing methods, framed thin-film masks, and organic semiconductor device manufacturing methods.
Document Type and Number:
Japanese Patent JP6347112
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a vapor deposition mask and a vapor deposition mask preparation body which satisfy both high-definition and weight saving even if their sizes become large, and can improve yield in a manufacturing process using the vapor deposition mask and improve quality, and a manufacturing method of an organic semiconductor device using the vapor deposition mask.SOLUTION: In a vapor deposition mask 100 in which a metal mask 10 provided with a slit 15 overlapping an opening part 25 is laminated on one surface of a resin mask 20 in which an opening 25 corresponding to a pattern produced by vapor deposition is provided, the above problem is solved by exposing at least a part of a surface on a side where the metal mask 100 contacts the resin mask 20 of the metal mask 10.
Inventors:
Toshihiko Takeda
Katsuya Obata
Hiroshi Kawasaki
Suzuki Tsuneichi
Miyako Niko
Katsuya Obata
Hiroshi Kawasaki
Suzuki Tsuneichi
Miyako Niko
Application Number:
JP2014022792A
Publication Date:
June 27, 2018
Filing Date:
February 07, 2014
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
C23C14/24; C23C14/12; H01L51/50; H05B33/10
Domestic Patent References:
| JP9143677A | ||||
| JP2003253434A | ||||
| JP2004190057A | ||||
| JP2013021165A | ||||
| JP2013084373A | ||||
| JP2013163864A | ||||
| JP5288072B2 |
Attorney, Agent or Firm:
Patent Business Corporation Intect International Patent Office
Yasuo Ishikawa
Yoshinori Ishibashi
Yasuo Ishikawa
Yoshinori Ishibashi