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Title:
A method for reaction machine Passivation
Document Type and Number:
Japanese Patent JP6224622
Kind Code:
B2
Abstract:
Disclosed is a process for passivating a surface of a dehydrochlorination reactor comprising: stopping a flow of hydrochlorofluoropropane to a reactor, passing a gas mixture comprising hydrogen gas through the reactor at a temperature of at least 25° C. for a period of time sufficient to restore the selectivity of a dehydrochlorination reaction, stopping the flow of the hydrogen gas mixture, and resuming the flow of hydrochlorofluoropropane to the dehydrochlorination reaction. Also disclosed is a process for producing a fluoropropene of formula CF3CX═CX2, wherein each X is F or H, at least one X is H and at least one X is F, comprising pyrolyzing a hydrochlorofluoropropane of formula CF3CXYCX2Y, wherein each X is F or H, at least one X is H, and at least one X is F and one Y is CI and the other Y is H, in the gas-phase in the absence of a catalyst in a reaction vessel, maintained at a temperature high enough to effect the pyrolysis of said hydrochlorofluoropropane to said fluoropropene, and wherein said reaction vessel is periodically subjected to a passivation step to passivate the inner surface of said reaction vessel. Also disclosed is a process for producing a fluoropropene of formula CF3CX═CX2, wherein each X is F or H, at least one X is H and at least one X is F, comprising pyrolyzing a hydrochlorofluoropropane of formula CF3CXYCX2Y, wherein each X is F or H, at least one X is H, and at least one X is F and one Y is CI and the other Y is H, in the gas-phase in the absence of a catalyst in a reaction vessel, maintained at a temperature high enough to effect the pyrolysis of said hydrochlorofluoropropane to said fluoropropene, and wherein said hydrochlorofluoropropane comprises less than 300 ppm of hydrogen fluoride.

Inventors:
Shu Hui Sun
Mario Joseph Nappa
Haiyou One
Hulk Kopkari
Application Number:
JP2014552248A
Publication Date:
November 01, 2017
Filing Date:
January 08, 2013
Export Citation:
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Assignee:
The Kemmers Company FC Limited Liability Company
International Classes:
C07C17/25; B01J19/00; C07C21/18
Domestic Patent References:
JP2014534961A
JP2015501300A
Attorney, Agent or Firm:
Patent Business Corporation Tani/Abe Patent Office