Title:
A micro mirror device and a manufacturing method for the same
Document Type and Number:
Japanese Patent JP6018926
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a micromirror device with a high yield that is compact, and low in a resonance frequency, and in which a mirror hardly performs a translational motion.SOLUTION: The micromirror device comprises: a support movable part (14 and 16) that supports a mirror part (12) having a reflection surface (12B) rotatably around a specific rotary axis; a piezoelectric actuator part (20 and 22) that is coupled to the support movable part (14 and 16), and performs a bending displacement by a deformation of a piezoelectric body; and a stationary frame part (26) that supports the piezoelectric actuator part (20 and 22) in a manner capable of the bending displacement. The support movable part (14 and 16) is composed of a metallic glass material. Metallic glass is subjected to a heating treatment to a temperature of a supercooling liquid area, and thereby a residual stress can be released. The metallic glass material of which a Young's modulus is lower than that of silicon is preferable. In order to avoid deterioration of piezoelectric performance due to a stress release reflow, it is preferable to use a PZT film having Nb of 6 to 20% doped.
Inventors:
Lee Zhuo
Hayashi
Cai
Masayoshi Esashi
Thomas Gesner
Takayuki Naono
Takamitsu Fujii
Hayashi
Cai
Masayoshi Esashi
Thomas Gesner
Takayuki Naono
Takamitsu Fujii
Application Number:
JP2013002040A
Publication Date:
November 02, 2016
Filing Date:
January 09, 2013
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G02B26/10; B81B3/00; B81C1/00; G02B26/08; H01L41/09; H01L41/18; H01L41/187; H01L41/22; H01L41/316; H01L41/39
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Attorney, Agent or Firm:
Kenzo Matsuura