Title:
Photomask and projection exposure equipment
Document Type and Number:
Japanese Patent JP6343525
Kind Code:
B2
Inventors:
Akira Nakazawa
Application Number:
JP2014174194A
Publication Date:
June 13, 2018
Filing Date:
August 28, 2014
Export Citation:
Assignee:
Oak Manufacturing Co., Ltd.
International Classes:
G03F1/70; G03F7/20
Domestic Patent References:
| JP2001085317A | ||||
| JP2003186173A | ||||
| JP200231896A |
Foreign References:
| US20030124868 |
Attorney, Agent or Firm:
Takashi Matsuura
Hiroki Ogura
Hiroki Ogura