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Title:
A plasma treatment system and a method of distributing multiple high frequency electric power uniformly between electrodes
Document Type and Number:
Japanese Patent JP6068825
Kind Code:
B2
Abstract:
Plasma treatment systems and methods for distributing RF energy to electrodes in a plasma treatment system. The plasma treatment system includes power and ground busses, positive and negative phase primary electrode busses, and positive and negative phase secondary electrode busses. The power and ground busses are coupled to the secondary electrode busses by isolation transformers so that the negative phase secondary electrode buss is provided with an RF signal that is 180 degrees out of phase with the RF signal supplied to the positive phase secondary electrode buss. The secondary electrode busses are coupled to respective positive and negative phase primary electrode busses by capacitors. The primary electrode busses are each coupled to electrodes in the vacuum chamber. Load coils coupling the primary electrode busses to an RF ground may cooperative with the capacitors to adjust the input impedance at the power buss.

Inventors:
Thomas Vi. Bolden
Elmer M. Carica
Robert S. Kondrashov
Louis Fierro
James Dee Getty
Application Number:
JP2012105137A
Publication Date:
January 25, 2017
Filing Date:
May 02, 2012
Export Citation:
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Assignee:
NORDSON CORPORATION
International Classes:
H05H1/46; C23C16/509; H01L21/205; H01L21/3065; H01L21/31
Domestic Patent References:
JP2009105030A
JP2011049570A
JP2008172168A
JP2009295580A
JP11312647A
Foreign References:
US20090102385
WO2006118161A1
US20100006543
US20090288773
US20020000201
US8333166
Attorney, Agent or Firm:
Okabe
Masao Okabe
Takao Ochi
Seiichiro Takahashi
Takao Matsui
Kosuke Uchida



 
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