Title:
A substrate treatment system, a substrate treating method, and a storage
Document Type and Number:
Japanese Patent JP6079510
Kind Code:
B2
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Inventors:
Youji Sakata
Takeshi Watanabe
Enokida Takashi
Kanagawa Kozo
Takashige Suematsu
Tetsuichi Shiraishi
Daisuke Homma
Yuji Suiko
Takeshi Watanabe
Enokida Takashi
Kanagawa Kozo
Takashige Suematsu
Tetsuichi Shiraishi
Daisuke Homma
Yuji Suiko
Application Number:
JP2013179983A
Publication Date:
February 15, 2017
Filing Date:
August 30, 2013
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/027; B05D3/00; B05D7/24; H01L21/677
Domestic Patent References:
| JP2006024643A | ||||
| JP11016978A | ||||
| JP2011186114A | ||||
| JP2004335750A | ||||
| JP2010123871A | ||||
| JP2009135294A | ||||
| JP2004193597A | ||||
| JP200082656A |
Attorney, Agent or Firm:
Toshio Inoue
Nobuaki Takizawa
Nobuaki Takizawa
Previous Patent: A processing method and a processing device of a rotating body
Next Patent: JPS6079511
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