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Title:
TARGET FOR ULTRAVIOLET GENERATION AND METHOD FOR PRODUCING THE SAME, AND ELECTRON BEAM EXCITATION ULTRAVIOLET LIGHT SOURCE
Document Type and Number:
Japanese Patent JP2018104645
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a target for ultraviolet generation that can generate ultraviolet light over a wide range of wavelength regions.SOLUTION: A target for ultraviolet generation 11 has a substrate 12 that allows ultraviolet light to pass therethrough, and a light emission layer 13 that is provided on the substrate 12 and receives an electron beam to emit ultraviolet light. The light emission layer 13 is an amorphous layer formed of AlOdoped with Sc.SELECTED DRAWING: Figure 2

Inventors:
IKEDA KOHEI
ICHIKAWA NORIO
Application Number:
JP2016255811A
Publication Date:
July 05, 2018
Filing Date:
December 28, 2016
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS KK
International Classes:
C09K11/64; C09K11/08; H01J63/06
Domestic Patent References:
JP2012201714A2012-10-22
JP2013245292A2013-12-09
Foreign References:
WO2016199729A12016-12-15
Other References:
LI,BIN ET AL.: "Ultraviolet emission and Fano resonance in doped nano-alumina", JOURNAL OF APPLIED PHYSICS, vol. 101,053534, JPN6020036669, 2007, pages 1 - 8, ISSN: 0004356502
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Kenichi Shibayama
Mt. Nakatsuka