Title:
ACTIVE GAS-GENERATING DEVICE AND FILM FORMATION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/003002
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an active gas-generating device capable of jetting highly uniform active gas. In a central region (R51) of a dielectric electrode (21) according to the present invention, gas-jetting holes (31)-(37) and gas-jetting holes (41)-(47) are provided as three or more gas-jetting holes in the X-direction and are formed together in a two-row configuration along the X-direction. For the gas-jetting holes (31)-(37) and gas-jetting holes (41)-(47) of the two-row configuration, the gas-jetting holes (3i) and the gas-jetting holes (4i) are alternately disposed along the X-direction by providing a difference in the X-direction between the positions at which the gas-jetting hole 31 and gas-jetting hole 41 are formed.
Inventors:
NISHIMURA SHINICHI (JP)
WATANABE KENSUKE (JP)
YAMADA YOSHIHITO (JP)
WATANABE KENSUKE (JP)
YAMADA YOSHIHITO (JP)
Application Number:
PCT/JP2016/069091
Publication Date:
January 04, 2018
Filing Date:
June 28, 2016
Export Citation:
Assignee:
TOSHIBA MITSUBISHI ELEC IND (JP)
International Classes:
C23C16/505; C01B13/11; H05H1/24
Foreign References:
| US20060193759A1 | 2006-08-31 | |||
| JP2013062270A | 2013-04-04 | |||
| JP2004142963A | 2004-05-20 |
Other References:
See also references of EP 3476975A4
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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