Title:
ANTI-CORROSIVE PHOTORESIST-REMOVING AGENT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/061701
Kind Code:
A1
Abstract:
An anti-corrosive photoresist-removing agent composition, which contains a polar organic solvent (A), an organic amine compound (B) and an anti-corrosive agent (C) which is composed of a combination of an aromatic polyhydroxy compound and a saccharide. The anti-corrosive photoresist-removing agent composition exhibits an excellent anti-corrosive effect on both copper and aluminum over a wide temperature range in the presence or absence of water.
Inventors:
YAMASAKI HAYATO (JP)
FUJIOKA TOYOZO (JP)
FUJIOKA TOYOZO (JP)
Application Number:
PCT/JP2009/068185
Publication Date:
June 03, 2010
Filing Date:
October 22, 2009
Export Citation:
Assignee:
IDEMITSU KOSAN CO (JP)
YAMASAKI HAYATO (JP)
FUJIOKA TOYOZO (JP)
YAMASAKI HAYATO (JP)
FUJIOKA TOYOZO (JP)
International Classes:
G03F7/42
Foreign References:
| JP2003532143A | 2003-10-28 | |||
| JP2005043873A | 2005-02-17 | |||
| JP2001222118A | 2001-08-17 | |||
| JP2003015320A | 2003-01-17 | |||
| JP2005077526A | 2005-03-24 |
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)
Tamotsu Otani (JP)
Download PDF: