Title:
APPARATUS FOR PRODUCING AND INSPECTING SEMICONDUCTOR
Document Type and Number:
WIPO Patent Application WO/2002/003452
Kind Code:
A1
Abstract:
An apparatus for producing and inspecting a semiconductor in which elevation of temperature or heat insulation can be carried out efficiently even when a resistance heater is heated and cooling can be carried out efficiently even when the temperature is lowered. In the apparatus for producing and inspecting a semiconductor, a ceramic substrate (21) having a conductor layer (22) formed internally or on the surface is placed in a supporting container (12) having planar bodies (14, 15). The planar bodies (14, 15) have a surface roughness Ra=20 $g(m)m or less based on JIS B 0601.
Inventors:
HIRAMATSU YASUJI (JP)
ITO YASUTAKA (JP)
ITO YASUTAKA (JP)
Application Number:
PCT/JP2001/005564
Publication Date:
January 10, 2002
Filing Date:
June 27, 2001
Export Citation:
Assignee:
IBIDEN CO LTD (JP)
HIRAMATSU YASUJI (JP)
ITO YASUTAKA (JP)
HIRAMATSU YASUJI (JP)
ITO YASUTAKA (JP)
International Classes:
H01L21/66; H01L21/00; H01L21/302; H01L21/3065; (IPC1-7): H01L21/68; H01L21/66; H05B3/20
Foreign References:
| JP2001102436A | 2001-04-13 |
Attorney, Agent or Firm:
Yasutomi, Yasuo (Nishinakajima 5-chome Yodogawa-ku Osaka-shi, Osaka, JP)
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