Title:
AUTOMATIC MASK REPLACEMENT METHOD AND AUTOMATIC MASK REPLACEMENT SYSTEM
Document Type and Number:
WIPO Patent Application WO/2019/244265
Kind Code:
A1
Abstract:
An automatic mask replacement method and an automatic mask replacement system based on the correspondence between a substrate group and a mask. The method comprises: a substrate conveyance step of conveying a substrate for each of substrate groups distinguished on the basis of a deviation amount of a pattern formed on the substrate with respect to a screen printing machine; a substrate confirmation step of confirming substrate information during the conveyance of the substrate in the substrate conveyance step; a mask selection step of selecting, from a plurality of masks prepared corresponding to the plurality of substrate groups, a relevant mask according to the result of the substrate confirmation step; and a mask replacement step of feeding the relevant mask to the screen printing machine from an automatic mask replacement machine accommodating the plurality of masks.
Inventors:
MAEDA FUMITAKA (JP)
Application Number:
PCT/JP2018/023402
Publication Date:
December 26, 2019
Filing Date:
June 20, 2018
Export Citation:
Assignee:
FUJI CORP (JP)
International Classes:
B41F15/12; B41F27/12
Foreign References:
| JPH0671847A | 1994-03-15 | |||
| JPH09300581A | 1997-11-25 | |||
| JPH0623747U | 1994-03-29 | |||
| JPH06305111A | 1994-11-01 | |||
| JPH07314639A | 1995-12-05 | |||
| US5226366A | 1993-07-13 |
Attorney, Agent or Firm:
HIROTA Akihiro (JP)
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