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Title:
CENTRIFUGAL BARREL POLISHING DEVICE AND CENTRIFUGAL BARREL POLISHING METHOD
Document Type and Number:
WIPO Patent Application WO/2013/125491
Kind Code:
A1
Abstract:
Provided is a centrifugal barrel polishing device capable of maintaining or improving polishing efficiency while increasing stock removal rate. The centrifugal barrel polishing device (10) polishes workpieces using polishing stones by loading the workpieces and the polishing stones in multiple barrels (12) that undergo planetary rotation. If N is defined as the speed of revolution of the barrels (12), n as the speed of rotation of the barrels (12), R as the radius of the path of revolution (15) drawn by the rotation axes (14) (centers of rotation) of the barrels (12), n/N as the rotation/revolution ratio, which is the ratio of the speed of rotation n to the speed of revolution N of the barrels (12), and F=4π2N2R/g as the relative centrifugal acceleration, which is the ratio of the centrifugal acceleration on the path of revolution (15) during planetary rotation of the barrels (12) to the gravitational acceleration g, the relative centrifugal acceleration F during planetary rotation of the barrels (12) is set to be in the range of the formula: -2.5(n/N)+12.6 ≤ F ≤ 6.1(n/N)+40.7.

Inventors:
TOMITA YOSHIYUKI (JP)
KOBAYASHI TOMOYUKI (JP)
Application Number:
PCT/JP2013/053882
Publication Date:
August 29, 2013
Filing Date:
February 18, 2013
Export Citation:
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Assignee:
TIPTON CORP (JP)
International Classes:
B24B31/033
Foreign References:
JPH02190255A1990-07-26
JPS4874391U1973-09-14
JP2008142877A2008-06-26
JP2009166226A2009-07-30
Attorney, Agent or Firm:
GRANDOM PATENT LAW FIRM (JP)
Patent business corporation grandam patent firm (JP)
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Claims: