Title:
DRIVE METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2005/078777
Kind Code:
A1
Abstract:
A stage is moved so that the same target operation is performed when acquiring first shift information (data 1) on a stage in the first state having no liquid immersion region formed on the stage (step 116) and when acquiring second shift information (data 3) on a stage in the second state having no liquid immersion region formed on the stage (step 122). In this case, the difference between the first shift information and the second shift information is information directly reflecting the difference between the first state and the second state. When performing exposure, the stage shift is controlled considering the correction information calculated according to the first shift information and the second shift information (step 126). Accordingly, it is possible to control the stage so that no error attributed to presence/absence of a liquid immersion region on the stage is caused. Thus, it is possible to improve the position control of a moving body.
Inventors:
MIZUTANI TAKEYUKI (JP)
Application Number:
PCT/JP2005/002216
Publication Date:
August 25, 2005
Filing Date:
February 15, 2005
Export Citation:
Assignee:
NIKON CORP (JP)
MIZUTANI TAKEYUKI (JP)
MIZUTANI TAKEYUKI (JP)
International Classes:
G03F7/20; H01L21/027; H01L21/68; (IPC1-7): H01L21/027; G03F7/20; H01L21/68
Foreign References:
| JP2000058436A | 2000-02-25 | |||
| JPH06168866A | 1994-06-14 |
Attorney, Agent or Firm:
Tateishi, Atsuji (Karakida Center Bldg. 1-53-9, Karakid, Tama-shi Tokyo, JP)
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