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Title:
EDGE BEAD REMOVER FOR THICK FILM PHOTORESISTS
Document Type and Number:
WIPO Patent Application WO2002035287
Kind Code:
A3
Abstract:
An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 pats by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.

Inventors:
OBERLANDER JOSEPH E
TRAYNOR CRAIG
SISON ERNESTO S
GRIFFIN JEFF
Application Number:
PCT/EP2001/011637
Publication Date:
August 22, 2002
Filing Date:
October 09, 2001
Export Citation:
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Assignee:
CLARIANT INT LTD (CH)
CLARIANT FINANCE BVI LTD (VG)
International Classes:
G03F7/16; (IPC1-7): G03F7/16
Domestic Patent References:
WO1989006378A11989-07-13
Foreign References:
US5814433A1998-09-29
US5151219A1992-09-29
Other References:
CHRISTENSEN LORNA D ET AL: "Evaluation and verification of improved edgebead removal process in CMOS production", ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XII;SANTA CLARA, CA, USA FEB 20-22 95, vol. 2438, 1995, Proc SPIE Int Soc Opt Eng;Proceedings of SPIE - The International Society for Optical Engineering 1995 Society of Photo-Optical Instrumentation Engineers, Bellingham, WA, USA, pages 753 - 758, XP008004602
SELVA M ET AL: "THE ADDITION REACTION OF DIALKYL CARBONATES TO KETONES", GAZZETTA CHIMICA ITALIANA, SOCIETA CHIMICA ITALIANA, ROME, IT, vol. 9, no. 123, September 1993 (1993-09-01), pages 515 - 518, XP008002145, ISSN: 0016-5603
OBERLANDER J ET AL: "Development of an edge bead remover (EBR) for thick films", ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVIII;SANTA CLARA, CA, UNITED STATES FEB 26-28 2001, vol. 4345, no. I, 2001, Proc SPIE Int Soc Opt Eng;Proceedings of SPIE - The International Society for Optical Engineering 2001, pages 475 - 483, XP008004601
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