ELECTROMAGNETIC FIELD ANALYSIS PROGRAM, ELECTROMAGNETIC FIELD ANALYSIS DEVICE, AND ELECTROMAGNETIC FIELD ANALYSIS METHOD

Title:

ELECTROMAGNETIC FIELD ANALYSIS PROGRAM, ELECTROMAGNETIC FIELD ANALYSIS DEVICE, AND ELECTROMAGNETIC FIELD ANALYSIS METHOD

Document Type and Number:

WIPO Patent Application WO/2022/070329

Kind Code:

A1

Abstract:

The present invention: identifies the magnitude of the width and the magnitude of the thickness of wiring included in first circuit information; generates, on the basis of the ratio of the magnitude of said width and the magnitude of said thickness, second circuit information in which the magnitude of the width or the magnitude of the thickness has been changed to zero; and executes electromagnetic field analysis on the basis of the second circuit information.

More Like This:

WO/2020/216572	METHOD OF DETERMINING CHARACTERISTIC OF PATTERNING PROCESS BASED ON DEFECT FOR REDUCING HOTSPOT
JP2023080408	LAYOUT DESIGN SUPPORT DEVICE, LAYOUT DESIGN SUPPORT METHOD, LAYOUT DESIGN SUPPORT DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
JP2020017211	NOISE PATH CALCULATION PROGRAM, NOISE PATH CALCULATION METHOD, AND INFORMATION PROCESSING DEVICE

Inventors:

YAMAZAKI TAKASHI (JP)
YAMANE SHOHEI (JP)
YAMADA HIROAKI (JP)
OHARA TOSHIYASU (JP)
KOCHIBE YOICHI (JP)

Application Number:

PCT/JP2020/037206

Publication Date:

April 07, 2022

Filing Date:

September 30, 2020

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FUJITSU LTD (JP)

International Classes:

G06F30/398

Foreign References:

JP2005107870A	2005-04-21
JP2003076741A	2003-03-14
JP2006053908A	2006-02-23
JP2006040308A	2006-02-09
JP2006053908A	2006-02-23

Attorney, Agent or Firm:

DOI Kenji et al. (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: EQUIVALENT CIRCUIT ANALYSIS PROGRAM, EQUIVALENT CIRCUIT ANALYSIS DEVICE, AND EQUIVALENT CIRCUIT ANAL...

Next Patent: METAL NANOPARTICLE DISPERSION