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Title:
ENRICHMENT METHOD AND ANALYSIS METHOD FOR PRECIOUS METAL ELEMENTS ON SURFACE OF WAFER
Document Type and Number:
WIPO Patent Application WO/2024/001016
Kind Code:
A1
Abstract:
An enrichment method and an analysis method for precious metal elements on the surface of a wafer. The enrichment method for the precious metal elements on the surface of the wafer comprises: first performing different treatments in sequence according to steps a), b), c) and d), thereby effectively transforming the precious metal elements in a metallic state to an ionic state, and changing the hydrophilic surface of the wafer into a hydrogen-passivated hydrophobic interface; and then, collecting metal contaminants from a hydrophobic interface layer by using a certain scanning liquid, then adding an alkaline solution for dilution, and controlling the pH value. According to the enrichment method, the scanning time can be obviously shortened, the collection efficiency of precious metal elements can be improved, and device corrosion can be effectively reduced.

Inventors:
ZOU ZHIWEN (CN)
ZHANG JUNHAO (CN)
HENG KEJI (CN)
CHENG SHIRAN (CN)
MENG QINGGUO (CN)
CUI HUSHAN (CN)
XU KAIDONG (CN)
Application Number:
PCT/CN2022/134762
Publication Date:
January 04, 2024
Filing Date:
November 28, 2022
Export Citation:
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Assignee:
JIANGSU LEUVEN INSTR CO LTD (CN)
International Classes:
G01N27/62
Foreign References:
JP2008130696A2008-06-05
JP2009021507A2009-01-29
JPH11190730A1999-07-13
CN110186994A2019-08-30
CN102565182A2012-07-11
CN110223927A2019-09-10
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW CO., LTD. (CN)
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