Title:
EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2004/105107
Kind Code:
A1
Abstract:
There is provided an exposure device capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and liquid. The exposure device projects a pattern image onto the substrate (P) via the projection optical system and the liquid so as to expose the substrate (P). The exposure device includes a liquid removal mechanism (40) for removing residual liquid from a part (7) arranged in the vicinity of the image surface of the projection optical system.
Inventors:
KOBAYASHI NAOYUKI (JP)
TANIMOTO AKIKAZU (JP)
MIZUNO YASUSHI (JP)
SHIRAISHI KENICHI (JP)
NAKANO KATSUSHI (JP)
OWA SOICHI (JP)
TANIMOTO AKIKAZU (JP)
MIZUNO YASUSHI (JP)
SHIRAISHI KENICHI (JP)
NAKANO KATSUSHI (JP)
OWA SOICHI (JP)
Application Number:
PCT/JP2004/007417
Publication Date:
December 02, 2004
Filing Date:
May 24, 2004
Export Citation:
Assignee:
NIKON CORP (JP)
KOBAYASHI NAOYUKI (JP)
TANIMOTO AKIKAZU (JP)
MIZUNO YASUSHI (JP)
SHIRAISHI KENICHI (JP)
NAKANO KATSUSHI (JP)
OWA SOICHI (JP)
KOBAYASHI NAOYUKI (JP)
TANIMOTO AKIKAZU (JP)
MIZUNO YASUSHI (JP)
SHIRAISHI KENICHI (JP)
NAKANO KATSUSHI (JP)
OWA SOICHI (JP)
International Classes:
G03F7/20; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| WO1999049504A1 | 1999-09-30 |
Foreign References:
| JPH11283903A | 1999-10-15 | |||
| JPH06124873A | 1994-05-06 | |||
| EP1420299A2 | 2004-05-19 |
Other References:
See also references of EP 1628329A4
Attorney, Agent or Firm:
Kawakita, Kijuro (5-4 Shinjuku 1-chom, Shinjuku-ku Tokyo, JP)
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