Title:
EXPOSURE DEVICE AND OUT-OF-FOCUS AND TILT ERROR COMPENSATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/045432
Kind Code:
A1
Abstract:
Disclosed are an exposure device and an out-of-focus and tilt error compensation method. On each alignment measurement sensor (500a, 500b, 500c, 500d, 500e, 500f), there is provided a focusing measurement sensor (600a, 600b, 600c, 600d, 600e, 600f) corresponding thereto, and each alignment measurement sensor (500a, 500b, 500c, 500d, 500e, 500f) has the same coordinates in a first direction as those of the focusing measurement sensor (600a, 600b, 600c, 600d, 600e, 600f) corresponding thereto, so that the alignment measurement sensors (500a, 500b, 500c, 500d, 500e, 500f) and the focusing measurement sensors (600a, 600b, 600c, 600d, 600e, 600f) are both located on the same straight line, in which case alignment marks can be characterized together by focusing measurement information and alignment measurement information, in order to provide corrections in case of errors in the alignment measurement information, complete compensation for out-of-focus and tilt errors, improve alignment precision greatly and increase product yield.
Inventors:
CHEN FEIBIAO (CN)
ZHOU CHANG (CN)
CHEN YUEFEI (CN)
CHENG QI (CN)
DIAO LEI (CN)
QI JINGCHAO (CN)
ZHOU CHANG (CN)
CHEN YUEFEI (CN)
CHENG QI (CN)
DIAO LEI (CN)
QI JINGCHAO (CN)
Application Number:
PCT/CN2015/083842
Publication Date:
March 31, 2016
Filing Date:
July 13, 2015
Export Citation:
Assignee:
SHANGHAI MICROELECTRONICS EQUI (CN)
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| WO2008065977A1 | 2008-06-05 |
Foreign References:
| CN1459671A | 2003-12-03 | |||
| CN102472987A | 2012-05-23 | |||
| JP4214849B2 | 2009-01-28 | |||
| JP4760019B2 | 2011-08-31 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
上海思微知识产权代理事务所（普通合伙） (CN)
上海思微知识产权代理事务所（普通合伙） (CN)
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