Title:
EXPOSURE METHOD AND SYSTEM, AND DEVICE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2005/078774
Kind Code:
A1
Abstract:
Exposure method and system for efficiently controlling a non-rotary symmetric component out of imaging characteristics when the light quantity distribution of an exposure beam passing through at least some optical member among a mask and a projection optical system is non-rotary symmetric. A projection exposure system for lighting a reticle (11) with an exposure light (IL) and projecting the pattern of the reticle (11) onto a wafer (18) via a projection optical system (14), wherein a lens (32) in the projection optical system (14) is locally illuminated with correcting lights (LBA, LBB), unlike the exposure light (IL), in a wavelength region easily absorbed by the lens (32) via 1/4 wavelength plates (51A, 51B) and waveguides (44A, 44B) to thereby control a non-rotary symmetric aberration.
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Inventors:
UCHIKAWA KIYOSHI (JP)
Application Number:
PCT/JP2005/002011
Publication Date:
August 25, 2005
Filing Date:
February 10, 2005
Export Citation:
Assignee:
NIKON CORP (JP)
UCHIKAWA KIYOSHI (JP)
UCHIKAWA KIYOSHI (JP)
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| WO2005022614A1 | 2005-03-10 | |||
| WO2003017004A2 | 2003-02-27 |
Foreign References:
| JP2001196305A | 2001-07-19 | |||
| JPH10256150A | 1998-09-25 | |||
| JPH1064790A | 1998-03-06 | |||
| JPH1050585A | 1998-02-20 | |||
| JPH1064790A | 1998-03-06 | |||
| JPH1050585A | 1998-02-20 | |||
| US1019403A | 1912-03-05 | |||
| EP0823662A2 | 1998-02-11 |
Other References:
See also references of EP 1724816A4
Attorney, Agent or Firm:
Omori, Satoshi (2075-2-501 Noborito, Tama-k, Kawasaki-shi Kanagawa 14, JP)
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