Title:
FABRICATION METHOD OF SEMICONDUCTOR FILM, SEMICONDUCTOR FILM, AND FIELD EFFECT TRANSISTOR
Document Type and Number:
WIPO Patent Application WO/2016/031968
Kind Code:
A1
Abstract:
The present invention provides a semiconductor film fabrication method capable of easily manufacturing a semiconductor film having an aligned orientation, a semiconductor film, and a field effect transistor, the semiconductor film (16A) comprising one or more semiconductor portions formed from a semiconductor material and one or more polymer portions formed from a polymer material, characterized in that the semiconductor portions and the polymer portions are adjacent and integrated.
Inventors:
TAKEYA JUNICHI (JP)
SOEDA JUNSHI (JP)
SOEDA JUNSHI (JP)
Application Number:
PCT/JP2015/074448
Publication Date:
March 03, 2016
Filing Date:
August 28, 2015
Export Citation:
Assignee:
UNIV TOKYO (JP)
International Classes:
H01L21/368; H01L21/336; H01L29/786; H01L51/05; H01L51/40
Domestic Patent References:
| WO2013172143A1 | 2013-11-21 | |||
| WO2009084584A1 | 2009-07-09 | |||
| WO2006019133A1 | 2006-02-23 | |||
| WO2014008395A1 | 2014-01-09 |
Foreign References:
| JP2013058680A | 2013-03-28 | |||
| JP2012033904A | 2012-02-16 | |||
| JP2006013492A | 2006-01-12 | |||
| JP2005243822A | 2005-09-08 |
Other References:
See also references of EP 3188219A4
Attorney, Agent or Firm:
YOSHIDA TADANORI (JP)
Yoshida Justice (JP)
Yoshida Justice (JP)
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