Title:
FAR-FIELD IMAGING IN ELECTRON MICROSCOPY
Document Type and Number:
WIPO Patent Application WO2005004188
Kind Code:
A3
Abstract:
There is provided a method and apparatus for far-field imaging that includes a small aperture that can be either scanned across an object to be imaged, or located in very near proximity to the specimen. Radiation is passed through the object and the aperture to form a diffraction pattern in the far-field. The intensity of the diffraction patterns are recorded for at least two aperture positions. Using the intensity measurements and known information about the aperture, an exit wave function of the object is determined. The exit wave function of the object is used to provide high-resolution information regarding the object.
Inventors:
RODENBURG JOHN MARIUS (GB)
FAULKNER HELEN MARY LOUISE (GB)
FAULKNER HELEN MARY LOUISE (GB)
Application Number:
PCT/GB2004/002699
Publication Date:
August 18, 2005
Filing Date:
June 23, 2004
Export Citation:
Assignee:
UNIV SHEFFIELD HALLAM
RODENBURG JOHN MARIUS (GB)
FAULKNER HELEN MARY LOUISE (GB)
RODENBURG JOHN MARIUS (GB)
FAULKNER HELEN MARY LOUISE (GB)
International Classes:
H01J37/22; H01J37/26; (IPC1-7): H01J37/22
Foreign References:
| EP0630040A1 | 1994-12-21 | |||
| US4758723A | 1988-07-19 | |||
| US5866905A | 1999-02-02 |
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