Title:
FILM FORMING DEVICE, FILM FORMING METHOD, OXIDE SEMICONDUCTOR FILM AND MULTILAYER BODY
Document Type and Number:
WIPO Patent Application WO/2023/079787
Kind Code:
A1
Abstract:
The present invention provides a film forming device which is provided with: an atomization unit which generates a mist by atomizing a starting material solution; a carrier gas supply unit which supplies a carrier gas that carries the mist, which has been generated in the atomization unit; and a film forming unit which forms a film by subjecting the mist, which has been carried thereto by the carrier gas, to a heat treatment. With respect to this film forming device, the film forming unit is provided with: a substrate stage part on which a substrate is placed; a nozzle which is arranged above the substrate stage part and supplies the mist onto the substrate; a top plate which is arranged above the substrate stage part and rectifies the mist supplied from the nozzle; and side walls which are arranged so as to face each other with the substrate stage part being interposed therebetween. If I (cm) is the height difference between a substrate stage surface of the substrate stage part and the bottom surface of the top plate and J (cm) is the shortest distance between a substrate stage region of the substrate stage part and the side walls, IJ ≤ 15 is satisfied. Consequently, the present invention provides a film forming device which is capable of forming a large-area film that has excellent in-plane uniformity of the film thickness distribution.
Inventors:
SAKATSUME TAKAHIRO (JP)
Application Number:
PCT/JP2022/026034
Publication Date:
May 11, 2023
Filing Date:
June 29, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
H01L21/365; C23C16/455; H01L21/368
Domestic Patent References:
WO2021065940A1 | 2021-04-08 | |||
WO2017187500A1 | 2017-11-02 | |||
WO2020261355A1 | 2020-12-30 |
Foreign References:
JP6925548B1 | 2021-08-25 | |||
JP2020098846A | 2020-06-25 | |||
JPH01257337A | 1989-10-13 | |||
JP2005307238A | 2005-11-04 | |||
JP2012046772A | 2012-03-08 | |||
JP5397794B1 | 2014-01-22 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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