Title:
FLUID CONTROL VALVE AND FLUID CONTROL DEVICE
Document Type and Number:
WIPO Patent Application WO/2024/101403
Kind Code:
A1
Abstract:
The present invention can be used in a semiconductor manufacturing process and makes it possible to reduce dead volume while keeping a valve structure simple. The present invention comprises a flow path block 2 in which an internal flow path 2R is formed, a valve seat member 5 having a valve seat surface 5a, a valve body 6 that is provided with a permanent magnet 60 and has a seating surface 6a seated on the valve seat surface 5a, and an actuator part 7 that drives the valve body 6 by using the permanent magnet 60, the permanent magnet 60 being sealed by a corrosion-resistant alloy.
Inventors:
HAYASHI SHIGEYUKI (US)
SHAKUDO KAZUYA (US)
SHAKUDO KAZUYA (US)
Application Number:
PCT/JP2023/040288
Publication Date:
May 16, 2024
Filing Date:
November 08, 2023
Export Citation:
Assignee:
HORIBA STEC CO LTD (JP)
International Classes:
F16K31/06
Foreign References:
| JP2020003042A | 2020-01-09 | |||
| JP2013172642A | 2013-09-02 | |||
| JP2015511366A | 2015-04-16 | |||
| JP2020201630A | 2020-12-17 |
Attorney, Agent or Firm:
NISHIMURA, Ryuhei et al. (JP)
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