Title:
GAS NOZZLE, METHOD FOR PRODUCING GAS NOZZLE, AND PLASMA TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/110965
Kind Code:
A1
Abstract:
The gas nozzle of the present disclosure comprises a tube-shaped feed hole for guiding a gas and a spray hole connected to the feed hole. The gas nozzle is for spraying the gas from the spray hole and is formed from a ceramic whose primary component is: a rare earth element oxide; fluoride or acid fluoride; or an yttrium aluminum compound oxide. The maximum value of the arithmetic mean roughness Ra of the inner circumferential surface forming the feed hole is 0.01μm-0.14μm.
Inventors:
NOGUCHI YUKIO (JP)
SAHASHI TOMOYA (JP)
SAHASHI TOMOYA (JP)
Application Number:
PCT/JP2019/045876
Publication Date:
June 04, 2020
Filing Date:
November 22, 2019
Export Citation:
Assignee:
KYOCERA CORP (JP)
International Classes:
H01L21/3065; B05B15/18; H01L21/31
Domestic Patent References:
| WO2006112392A1 | 2006-10-26 | |||
| WO2014119177A1 | 2014-08-07 | |||
| WO2007032086A1 | 2007-03-22 | |||
| WO2018190220A1 | 2018-10-18 |
Foreign References:
| JP2005286069A | 2005-10-13 | |||
| JP2017091779A | 2017-05-25 | |||
| JP2008222979A | 2008-09-25 | |||
| JP2013049096A | 2013-03-14 | |||
| JPH1050677A | 1998-02-20 |
Attorney, Agent or Firm:
BUNA PATENT ATTORNEYS (JP)
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