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Title:
GAS PIPELINE CLEANING MECHANISM FOR CHEMICAL VAPOR DEPOSITION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2022/217498
Kind Code:
A1
Abstract:
A gas pipeline cleaning mechanism for a chemical vapor deposition system. The gas pipeline cleaning mechanism comprises a housing, a transfer pump and a first pipeline. The housing comprises a mounting cavity and a cleaning fluid cavity that are isolated from each other, and the cleaning fluid cavity is used for accommodating a cleaning fluid; the transfer pump is arranged in the mounting cavity, and the transfer pump comprises a fluid input end and a fluid output end, wherein the fluid input end communicates with the mounting cavity and is used for sucking the cleaning fluid; and one end of the first pipeline communicates with the fluid output end, and the other end thereof is provided with a pipeline interface fitted with a fluid inlet of a gas pipeline. In comparison with manually squeezing a spraying pot, the flowing speed of a cleaning fluid transferred by the transfer pump is stable, and the stress on the gas pipeline is uniform. In addition, the pipeline interface is fitted with the fluid inlet of the gas pipeline, and thus a good leakproof effect is achieved. Therefore, the gas pipeline cleaning mechanism is less prone to having leakage of a cleaning fluid, and is less prone to the risk of corroding an operator's hands and the risk of causing a machine to stop running, thereby improving the safety of an operator, and enhancing the stability of a machine.

Inventors:
ZHONG FENG (CN)
LIU QINKANG (CN)
Application Number:
PCT/CN2021/087240
Publication Date:
October 20, 2022
Filing Date:
April 14, 2021
Export Citation:
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Assignee:
TAIWAN SEMICONDUCTOR MFG CO LTD (CN)
TSMC CHINA COMPANY LTD (CN)
International Classes:
B08B9/032; B08B13/00
Domestic Patent References:
WO2008018729A12008-02-14
Foreign References:
CN207494152U2018-06-15
CN206356333U2017-07-28
Attorney, Agent or Firm:
BEIJING EAST IP LTD. (CN)
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