Title:
A GAS SUPPLY APPARATUS WITH IMPROVED CONTROL
Document Type and Number:
WIPO Patent Application WO2007086766
Kind Code:
A9
Abstract:
A gas supply apparatus with improved control is provided. The gas supply apparatus provides gas at an outlet junction. The apparatus includes a gas mixer for gasses from primary and secondary supplies to a given ratio. The apparatus also includes a gas reservoir supplied by the gas mixer. A tertiary supply valve is also included and connected in parallel with the reservoir. The tertiary supply valve is adapted to connect the outlet junction to a tertiary gas supply when gas is not being supplied to a mixer by the primary and/or secondary supply.
Inventors:
CHAPMAN ANDREW MICHAEL (NZ)
POTTER BRUCE WILLIAM (NZ)
POTTER BRUCE WILLIAM (NZ)
Application Number:
PCT/NZ2007/000021
Publication Date:
September 20, 2007
Filing Date:
January 24, 2007
Export Citation:
Assignee:
DEVX TECH IP LTD (NZ)
CHAPMAN ANDREW MICHAEL (NZ)
POTTER BRUCE WILLIAM (NZ)
CHAPMAN ANDREW MICHAEL (NZ)
POTTER BRUCE WILLIAM (NZ)
International Classes:
A62B9/02; A61M16/12
Download PDF:
Previous Patent: A HYPOXIC TRAINING APPARATUS WITH AN IMPROVED HOUSING
Next Patent: DEVICE FOR FORMING NON-CIRCULAR APERTURES
Next Patent: DEVICE FOR FORMING NON-CIRCULAR APERTURES