Title:
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/059745
Kind Code:
A1
Abstract:
An imprint apparatus includes a substrate holding unit (4) configured to hold a substrate (6) and to be movable, a coating unit (7) configured to apply an imprint material (8) to the substrate (6), and a mold foreign matter removal unit (3) provided in the substrate holding unit (4) and configured to remove a foreign matter on a surface of the mold (2). The mold foreign matter removal unit (3) removes the foreign matter on the surface of the mold (2) by ejecting an ejection material toward the mold (2) after the imprint material (8) is applied to the substrate (6) by the coating unit (7) and before the mold (2) is brought into contact with the imprint material (8) applied to the substrate (6).
Inventors:
YAEGASHI KENJI (JP)
Application Number:
PCT/JP2015/004323
Publication Date:
April 21, 2016
Filing Date:
August 27, 2015
Export Citation:
Assignee:
CANON KK (JP)
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| WO2010039196A1 | 2010-04-08 |
Foreign References:
| US20070076197A1 | 2007-04-05 | |||
| US20150170922A1 | 2015-06-18 | |||
| US20130320589A1 | 2013-12-05 |
Attorney, Agent or Firm:
TAKAOKA, Ryoichi (Ikebukuro Tosei Building 5th Floor, 5-4-7 Nishi Ikebukuro, Toshima-k, Tokyo 21, JP)
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