IMPRINTING DEVICE AND IMPRINTING METHOD

WIPO Patent Application WO/2021/132142

A1

The purpose of the present invention is to provide an imprinting device and an imprinting method that can reduce the deformation of a forming pattern that has been transferred.　Provided is an imprinting device for transferring a forming pattern of a mold 1 to an object-to-be-shaped 3 by applying pressure to the object-to-be-shaped 3 with the mold 1 and a substrate 2. The imprinting device is configured by including: a stage 4 on which either the mold 1 or the substrate 2 is placed; a disposition means 5 for disposing either the mold 1 or the substrate 2, whichever is not placed on the stage 4, at a position at which the object-to-be-shaped 3 is sandwiched by the mold 1 and the substrate 2, and at which the mold 1 and the substrate 2 can freely move in a direction of mutual approach; a pressure adjusting unit 6 having a pressure adjusting chamber 61 that can encapsulate the mold 1 and the substrate 2; a depressurizing means 71 for depressurizing the inside of the pressure adjusting chamber 61; a pressurizing means 72 for pressurizing the inside of the pressure adjusting chamber 61 within a range in which the mold 1 and the substrate 2 can freely move in the direction of mutual approach; and a fixing means 8 for causing the object-to-be-shaped 3 to be fixed to the forming pattern.

KONDO YUKIKO (JP)
TANAKA SATORU (JP)

PCT/JP2020/047648

July 01, 2021

December 21, 2020

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SCIVAX CORP (JP)

H01L21/027; B29C59/02

WO2007105474A1	2007-09-20
WO2015186736A1	2015-12-10
WO2008088068A1	2008-07-24
WO2004062886A1	2004-07-29

JP2004504718A	2004-02-12
US5947027A	1999-09-07
JP2008246944A	2008-10-16
US6190929B1	2001-02-20
JP2008221706A	2008-09-25

See also references of EP 4084044A4

OKUDA Noritsugu (JP)

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