Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
IMPROVED MEGASONIC CLEANING EFFICIENCY USING AUTO- TUNING OF AN RF GENERATOR AT CONSTANT MAXIMUM EFFICIENCY
Document Type and Number:
WIPO Patent Application WO2004071938
Kind Code:
A3
Abstract:
system and method of cleaning a substrate (202) includes a megasonic chamber (206) that includes a transducer (210) and a substrate (202). The transducer (210) is being oriented toward the substrate (202). A variable distance d separates the transducer (210) and the substrate (202). The system (200) also includes a dynamically adjustable RF generator (212) that has an output coupled to the transducer. The dynamically adjustable RF generator (212) can be controlled by a phase comparison of an oscillator output (306) voltage and a phase of an RF generator output voltage. The dynamically adjustable RF generator (212) can also be controlled by monitoring a peak voltage of an output signal and controlling the RF generator to maintain the peak voltage within a predetermined voltage range. The dynamically adjustable RF generator (212) can also be controlled by dynamically controlling a variable DC power supply voltage.

Inventors:
BOYD JOHN
KUTHI ANDRAS
THIE WILLIAM
SMITH MICHAEL G R
KNOP ROBERT
ANDERSON THOMAS W
Application Number:
PCT/US2003/041226
Publication Date:
December 29, 2004
Filing Date:
December 23, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
LAM RES CORP (US)
International Classes:
B06B1/02; B08B3/10; B08B3/12; H01L21/00; (IPC1-7): H01L21/302
Foreign References:
US6681781B22004-01-27
US6333268B12001-12-25
US6311702B12001-11-06
US5601655A1997-02-11
US6713022B12004-03-30
US6706337B22004-03-16
US6623700B12003-09-23
US6503454B12003-01-07
US6370005B12002-04-09
US5931173A1999-08-03
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: MACHINE FOR INJECTING LIQUIDS

Next Patent: SYSTEM AND METHOD FOR SUB-PIXEL ELECTRONIC ALIGNMENT