Title:
IN-SITU THICKNESS AND REFRACTIVE INDEX MONITORING AND CONTROL SYSTEM FOR THIN FILM DEPOSITION
Document Type and Number:
WIPO Patent Application WO2002029358
Kind Code:
A9
Abstract:
A method of determining thickness and refractive index of an optical thin film is described. The method includes generating a diagnostic light beam having a first and a second wavelength. The method also includes measuring unattenuated light intensities at the first and the second wavelength of the diagnostic light beam. The method also includes measuring attenuated light intensities at the first and the second wavelength of the diagnostic light beam after transmission through the optical thin film. A null light intensity for the diagnostic light beam at the first and second wavelength is also determined. A first and second normalized intensity function is determined using the measured unattenuated light intensities, the measured attenuated light intensities, and the measured null light intensities. The thickness and refractive index of the optical thin film is then determined by solving the first and second normalized intensity function for thickness and refractive index.
Inventors:
ZHANG JIAN (US)
PAN JING (US)
PAN JING (US)
Application Number:
PCT/US2001/031026
Publication Date:
October 17, 2002
Filing Date:
October 04, 2001
Export Citation:
Assignee:
OPNETICS CORP (US)
ZHANG JIAN (US)
PAN JING (US)
ZHANG JIAN (US)
PAN JING (US)
International Classes:
G01B11/06; G01N21/41; G01N21/59; G01N21/84; G01N21/39; (IPC1-7): G01B11/06; G01N21/41
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