Title:
ION DETECTION SENSOR MANUFACTURING METHOD AND ION DETECTION SENSOR MANUFACTURED BY ION DETECTION SENSOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/092656
Kind Code:
A1
Abstract:
An embodiment of the present invention provides: an ion detection sensor manufacturing method in which a manufacturing process is simplified and manufacturing costs are reduced; and an ion detection sensor manufactured by an ion detection sensor manufacturing method. Here, included are the steps of: preparing an ion-sensitive film preparation solution; preparing an ion-sensitive mixed layer preparation solution by mixing the ion-sensitive film preparation solution and graphene powder; and preparing an ion-sensitive mixed layer that responds to target ions, by filling a gap between a source electrode and a drain electrode that are spaced apart from each other and applying the ion-sensitive mixed layer preparation solution so as to cover at least part of the upper portions of the source electrode and the drain electrode.
Inventors:
CHO SEUNG MIN (KR)
CHO MIN GU (KR)
KIM KI SOO (KR)
OH HONG GI (KR)
CHO MIN GU (KR)
KIM KI SOO (KR)
OH HONG GI (KR)
Application Number:
PCT/KR2021/014453
Publication Date:
May 05, 2022
Filing Date:
October 18, 2021
Export Citation:
Assignee:
MCK TECH CO LTD (KR)
International Classes:
G01N27/414; G01N33/487
Domestic Patent References:
WO2018208742A1 | 2018-11-15 |
Foreign References:
KR20190083120A | 2019-07-11 | |||
KR20190019013A | 2019-02-26 | |||
JP2020153695A | 2020-09-24 | |||
KR20150004254A | 2015-01-12 |
Attorney, Agent or Firm:
LEE, Jaemyung (KR)
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