LOW-REFLECTIVE FILM, METHOD FOR FORMATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH, AND COATING SOLUTION FOR FORMATION OF LOW-REFLECTIVE FILM, METHOD FOR PREPARATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH

WIPO Patent Application WO/2012/008427

A1

[Problem] To provide a low-reflective film to be formed on a transparent base material and a method for forming the low-reflective film. Specifically, to provide a low-reflective film which can have a low refractive index and a low reflectance when prepared in the form of a single-layered film and can be formed so as to have a large surface area in a simpler manner, a method for forming the low-reflective film, and a low-reflective member equipped with the low-reflective film. [Solution] A low-reflective film and a process for producing the low-reflective film, said low-reflective film characterised by comprising silica microparticles and at least one metal oxide selected from a group consisting of tungsten oxide, niobium oxide, tantalum oxide, titanium oxide, zirconium oxide, tin oxide, aluminum oxide, hafnium oxide, chromium oxide, cerium oxide, molybdenum oxide and lanthanum oxide as a binder in an amount of 5 to 40 mass% inclusive relative to the amount of the silica microparticles, and by having a refractive index of 1.20 to 1.40 inclusive.

SUGIMOTO TOSHIAKI
TAKANOBU NAOFUMI
HARA IKUNARI

PCT/JP2011/065840

January 19, 2012

July 12, 2011

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CENTRAL GLASS CO LTD (JP)
SUGIMOTO TOSHIAKI
TAKANOBU NAOFUMI
HARA IKUNARI

C03C17/25; C09D1/00; C09D7/12; C09D185/00; H01L31/042

JPH08122501A	1996-05-17
JP2003531087A	2003-10-21
JP2010134462A	2010-06-17
JP2008040171A	2008-02-21

KOBAYASHI, Hiromichi et al. (JP)
Hiromichi Kobayashi (JP)

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