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Title:
MATERIAL FOR THERMAL BONDING, COATING MATERIAL FOR THERMAL BONDING, COATING, AND ELECTRONIC COMPONENT BONDING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/081255
Kind Code:
A1
Abstract:
Provided is a method for bonding metal components by metal microparticle sintering mediated by a metal sintered film, such that shorts do not occur readily between bonded sections, and bonding strength is higher than that achieved by plating or sputtering. A material for thermal bonding, obtained by dispersing metal microparticles (P) in an organic compound dispersion medium (A) that melts or softens through heating at a temperature higher than 30ºC, is interposed between members of identical or dissimilar type, selected from among metal members, semiconductor members and ceramic members. The material for thermal bonding is characterized in that 60 wt% or more of the organic compound dispersion medium (A) comprises one, two or more types of a polyol (A1) having a melting point or softening point of 30ºC or higher and having two or more hydroxyl groups in the molecule, and 80 wt% or more of the metal microparticles (P) comprises metal microparticles (P1) that are heat-sinterable and that have an average particle size of primary particles ranging from 5 to 200 nm.

Inventors:
ASADA TOSHIAKI (JP)
FUJIWARA HIDEMICHI (JP)
Application Number:
PCT/JP2011/007021
Publication Date:
June 21, 2012
Filing Date:
December 15, 2011
Export Citation:
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Assignee:
FURUKAWA ELECTRIC CO LTD (JP)
ASADA TOSHIAKI (JP)
FUJIWARA HIDEMICHI (JP)
International Classes:
B22F1/0545; B22F1/107; B22F9/00; B23K20/00; C09J1/00; C09J11/04; C09J11/06; H01B1/00; H01B1/22; H01B5/14; H01L21/52; H05K3/32
Domestic Patent References:
WO2008065728A12008-06-05
Foreign References:
JP2010202943A2010-09-16
JP2005205696A2005-08-04
JP2009140880A2009-06-25
Attorney, Agent or Firm:
HOSOI, Isamu et al. (JP)
Isamu Hosoi (JP)
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Claims: