METHOD OF ANALYZING VAPORIZATION PATTERN OF SOLVENT AND SOLVENT VACUUM VAPORIZATION DEVICE

Title:

METHOD OF ANALYZING VAPORIZATION PATTERN OF SOLVENT AND SOLVENT VACUUM VAPORIZATION DEVICE

Document Type and Number:

WIPO Patent Application WO/2005/026717

Kind Code:

A1

Abstract:

A method of analyzing the vaporization pattern of a solvent, wherein a solvent gas with single component or multiple components vaporizing under any vaporization treatment conditions from a treated material including a solvent with single or multiple components stored in an air-tight container is exhausted to an exhaust route connected to the exhaust port of an exhaust means continuously from the inside of the air-tight container by using the exhaust means. A specimen gas is sampled at any place from the air-tight container to the outlet of the exhaust route and at any time interval while maintaining a continuous exhaust state. The solvent gas contained in the sampled specimen gas is measured and, by using the measured results, the vaporization pattern of the solvent from the treated material under any vaporization treatment conditions is obtained.

Inventors:

MUKAI KOJI (JP)
ITO FUJIO (JP)
TAKAHASHI SATORU (JP)

Application Number:

PCT/JP2004/013039

Publication Date:

March 24, 2005

Filing Date:

September 08, 2004

Export Citation:

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Assignee:

FUJISAWA PHARMACEUTICAL CO (JP)
MUKAI KOJI (JP)
ITO FUJIO (JP)
TAKAHASHI SATORU (JP)

International Classes:

G01N7/16; G01N1/00; G01N1/22; (IPC1-7): G01N30/04

Foreign References:

JP2003014721A	2003-01-15
JPH04131736A	1992-05-06
JPH02115765A	1990-04-27
JPH03284651A	1991-12-16
JPS54126599A	1979-10-01

Other References: