Title:
METHOD OF FORMING HIGH-QUALITY DIAMOND AND DEVICE THEREFOR
Document Type and Number:
WIPO Patent Application WO/2001/092611
Kind Code:
A1
Abstract:
A method of producing high-quality diamond, wherein a base material (13) for forming a diamond thin film and a material gas are introduced into the interior of a vacuum container (1), and plasma is generated in the container (1) to form a high-quality diamond thin film produced from the material gas on a surface of the base material (13), the interior of the vacuum container (1) being divided into a process space (16) for housing the base material (13) and a plasma generating space (15), the two spaces being allowed to communicate to each other via an opening (24) having a variable opening area to keep an electron temperature of the process space (16) at a low level.
Inventors:
SATO NORIYOSHI (JP)
IIZUKA SATORU (JP)
IIZUKA SATORU (JP)
Application Number:
PCT/JP2000/003450
Publication Date:
December 06, 2001
Filing Date:
May 29, 2000
Export Citation:
Assignee:
TOHOKU TECHNO ARCH CO LTD (JP)
SATO NORIYOSHI (JP)
IIZUKA SATORU (JP)
SATO NORIYOSHI (JP)
IIZUKA SATORU (JP)
International Classes:
C23C16/27; C23C16/452; C30B25/10; (IPC1-7): C30B29/04; C23C16/27
Foreign References:
JPH08325095A | 1996-12-10 | |||
JPH09111461A | 1997-04-28 | |||
JPH06188206A | 1994-07-08 |
Attorney, Agent or Firm:
Shigenobu, Kazuo (Kojimachi 4-chome Chiyoda-ku Tokyo, JP)
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