Title:
METHOD OF MAKING BARRIER LAYERS
Document Type and Number:
WIPO Patent Application WO/2004/105096
Kind Code:
A2
Abstract:
The present invention involves a low-temperature, photoresist-free method of fabricating a barrier layer on a flexible substrate. An embodiment involves the conversion of a precursor into a top-surface imaging layer during a direct patterning step. Preferred precursors are formed from a metal complex comprising at least one ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, arnine, halide, nitro, and mixtures thereof and at least one metal selected from the group consisting of Li, Al, Si, Ti, V, Cr, Mn, Fe, Ni, Co, Cu, Zn, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, In, Sn, Ba, La, Pr, Sm, Eu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Pb, Th, U, Sb, As, Ce, Mg, and mixtures thereof.
Inventors:
MALONEY DAVID J (US)
LEE WAI MUN (US)
ROMAN PAUL J JR (US)
FURY MICHAEL A (US)
LEE WAI MUN (US)
ROMAN PAUL J JR (US)
FURY MICHAEL A (US)
Application Number:
PCT/US2004/015861
Publication Date:
December 02, 2004
Filing Date:
May 17, 2004
Export Citation:
Assignee:
EKC TECHNOLOGY INC (US)
MALONEY DAVID J (US)
LEE WAI MUN (US)
ROMAN PAUL J JR (US)
FURY MICHAEL A (US)
MALONEY DAVID J (US)
LEE WAI MUN (US)
ROMAN PAUL J JR (US)
FURY MICHAEL A (US)
International Classes:
B05D3/00; B05D5/12; C23C18/14; G03F7/004; G03F7/09; H01L21/00; H01L21/027; H01L21/033; H01L21/06; H01L21/308; H01L21/31; H01L21/469; H01L35/24; H01L51/52; H01L; (IPC1-7): H01L/
Foreign References:
| US20020076495A1 | 2002-06-20 | |||
| US5652067A | 1997-07-29 | |||
| US20020197415A1 | 2002-12-26 | |||
| US5534312A | 1996-07-09 | |||
| US6413645B1 | 2002-07-02 | |||
| US20020168545A1 | 2002-11-14 | |||
| US6348239B1 | 2002-02-19 |
Other References:
TOHGE N ET AL: "EFFECTS OF UV-IRRADIATION ON THE FORMATION OF OXIDE THIN FILMS FROM CHEMICALLY MODIFIED METAL-ALKOXIDES" JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, KLUWER ACADEMIC PUBLISHERS, DORDRECHT, NL, vol. 2, no. 1/2/3, January 1994 (1994-01), pages 581-585, XP000463609 ISSN: 0928-0707
HILL R H ET AL: "AN INORGANIC APPROACH TO PHOTOLITHOGRAPHY: THE PHOTOLITHOGRAPHIC DEPOSITION OF DIELECTRIC METAL OXIDE FILMS" ACS SYMPOSIUM SERIES, WASHINGTON, DC, US, vol. 706, 7 September 1997 (1997-09-07), pages 53-66, XP009004380 ISSN: 0097-6156
HILL R H ET AL: "AN INORGANIC APPROACH TO PHOTOLITHOGRAPHY: THE PHOTOLITHOGRAPHIC DEPOSITION OF DIELECTRIC METAL OXIDE FILMS" ACS SYMPOSIUM SERIES, WASHINGTON, DC, US, vol. 706, 7 September 1997 (1997-09-07), pages 53-66, XP009004380 ISSN: 0097-6156
Attorney, Agent or Firm:
Mcdonald, James S. (Lewis & Bockius LLP 2 Palo Alto Square,
3000 El Camino Real, Suite 70, Palo Alto CA, US)
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