Title:
METHOD OF MANUFACTURING TRANSPARENT ELECTRODE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/1985/003378
Kind Code:
A1
Abstract:
A method of manufacturing a transparent electrode substrate includes the steps of: forming on an insulating transparent substrate film (A) a high polymer layer (B) constituted by at least one of a polyurethane, a polyester and an epoxy resin; partially forming a water-soluble coating layer (C) on the high polymer layer (B); forming on the water-soluble coating layer (C) a transparent conductor film layer (D) having a sheet resistance of 10 to 104OMEGA/$(1,5)$; and rinsing, thereby dissolution-removing both the water-soluble coating layer (C) and the transparent conductor film layer (D) thereon.
Inventors:
HATAKEYAMA HIROSHI (JP)
OGAWA MASAYUKI (JP)
MATSUMURA KOZO (JP)
NAKAGAWA EIJI (JP)
OGAWA MASAYUKI (JP)
MATSUMURA KOZO (JP)
NAKAGAWA EIJI (JP)
Application Number:
PCT/JP1985/000018
Publication Date:
August 01, 1985
Filing Date:
January 18, 1985
Export Citation:
Assignee:
NISSHA PRINTING (JP)
International Classes:
G02F1/1333; G09F9/30; H01B13/00; H01B5/14; H01H1/06; H01H11/04; H01L31/0224; H01L31/0392; H01L31/18; H05B33/20; H05K3/04; (IPC1-7): H01B13/00; H01B5/14; H05K3/06
Foreign References:
| JPS5156966A | 1976-05-19 | |||
| JPS51143892A | 1976-12-10 | |||
| JPS5610450A | 1981-02-02 | |||
| JPS5521460B2 | 1980-06-10 | |||
| JPS4724446B1 | ||||
| JPS5236495A | 1977-03-19 | |||
| JPS5242396A | 1977-04-01 | |||
| JPS5792704A | 1982-06-09 |
Other References:
See also references of EP 0178327A4
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