Title:
METHOD FOR PREPARING HIGH-PURITY AU POWDERS USING DRY METHOD
Document Type and Number:
WIPO Patent Application WO/2014/065453
Kind Code:
A1
Abstract:
The present invention relates to a method for preparing high-purity Au powders by applying a dry method (plasma processing) so as to prepare an Au target which is used for a semiconductor. The present invention is characterized in that high-purity Au powders can be prepared through plasma processing in which an ingot applied to plasma is a spent waste target and in granular form. According to the present invention, it is possible to prepare high-purity Au powders in a short time through plasma without post-processing. Au powders are prepared by setting a chamber atmosphere of plasma equipment to a vacuum atmosphere; forming plasma and a melting pool by inputting a certain amount of a waste target and granules and then removing metal impurities having low melting point; removing remaining impurities by means of a reducing gas; and modifying the electrical power of plasma, the amount of plasma gas, and retention time, thereby producing highly pure Au powder.
Inventors:
LEE HYO WON (KR)
YOON WON KYU (KR)
YANG SEUNG HO (KR)
HONG GIL SU (KR)
YOON WON KYU (KR)
YANG SEUNG HO (KR)
HONG GIL SU (KR)
Application Number:
PCT/KR2012/008955
Publication Date:
May 01, 2014
Filing Date:
October 29, 2012
Export Citation:
Assignee:
HEE SUNG METAL LTD (KR)
International Classes:
B22F9/14
Foreign References:
| KR20100136653A | 2010-12-29 | |||
| KR20100068060A | 2010-06-22 | |||
| KR20100032240A | 2010-03-25 | |||
| KR20110075106A | 2011-07-06 |
Attorney, Agent or Firm:
SHINN, Kwan Ho (KR)
신관호 (KR)
신관호 (KR)
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