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Title:
METHOD FOR PRODUCING OLIGOFURAN COMPOUND CONTAINING REACTIVE SILYL GROUP, AND OLIGOFURAN COMPOUND CONTAINING REACTIVE SILYL GROUP
Document Type and Number:
WIPO Patent Application WO/2023/080042
Kind Code:
A1
Abstract:
A method for producing a dihydrosilyloligofuran compound, comprising a deprotonization step in which an oligofuran compound is deprotonized in the presence of a deprotonization agent and a silylation step in which the product of deprotonization of the oligofuran compound is reacted with a hydrosilane compound, the oligofuran compound being a dimer to 256-mer of a monofuran compound.

Inventors:
TACHIBANA YUYA (JP)
BEPPU SHUNSUKE (JP)
KASUYA KEN-ICHI (JP)
Application Number:
PCT/JP2022/040026
Publication Date:
May 11, 2023
Filing Date:
October 26, 2022
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Assignee:
UNIV GUNMA NAT UNIV CORP (JP)
International Classes:
C07F7/08
Domestic Patent References:
WO2014061019A12014-04-24
Foreign References:
JP2002255975A2002-09-11
Other References:
CHEN WANGQIAO, TAN SI YU, ZHAO YANLI, ZHANG QICHUN: "A concise method to prepare novel fused heteroaromatic diones through double Friedel–Crafts acylation", ORG. CHEM. FRONT., vol. 1, no. 4, 1 January 2014 (2014-01-01), pages 391 - 394, XP093064597, DOI: 10.1039/C4QO00032C
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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