METHOD FOR PURIFYING FLUORINE GAS - CENTRAL GLASS CO LTD

Title:

METHOD FOR PURIFYING FLUORINE GAS

Document Type and Number:

WIPO Patent Application WO/2010/113689

Kind Code:

A1

Abstract:

Disclosed is a method for purifying fluorine gas by using a reaction vessel to decrease the concentration of hydrogen fluoride in crude fluorine gas obtained by means of electrolysis of a fused salt containing hydrogen fluoride in an electrolysis vessel. The method for purifying fluorine gas is characterized by the temperature in the aforementioned reaction vessel being in the temperature range above the boiling point of fluorine and below the melting point of hydrogen fluoride, and disposing a regularized filler in the aforementioned reaction vessel.

More Like This:

JP7274796	electrolytic cell
WO/2024/005269	COMBUSTION SYSTEM USING AMMONIA AS RAW MATERIAL
WO/2021/252535	SYSTEM AND METHOD FOR HIGH CONCENTRATION OF MULTIELECTRON PRODUCTS OR CO IN ELECTROLYZER OUTPUT

Inventors:

MIYAZAKI TATSUO
MORI ISAMU

Application Number:

PCT/JP2010/054913

Publication Date:

October 07, 2010

Filing Date:

March 23, 2010

Export Citation:

Click for automatic bibliography generation Help

Assignee:

CENTRAL GLASS CO LTD (JP)
MIYAZAKI TATSUO
MORI ISAMU

International Classes:

C25B15/08; C01B7/20; C25B1/24; C25B9/00

Foreign References:

JP2003190762A	2003-07-08
JP2005264231A	2005-09-29
JPS63210288A	1988-08-31
JP2001329380A	2001-11-27

Attorney, Agent or Firm:

HASHIMOTO, Takeshi et al. (JP)
Hashimoto 剛 (JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: COMPOSITION FOR ORAL CAVITY

Next Patent: INFORMATION PROCESSOR, INFORMATION PROCESSING METHOD, AND PROGRAM